SEMICON Korea 2018
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UBmaterials Inc.
 
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Tungsten(W) CMP slurry/Nano colloidal ceria slurry
Tungsten(W) CMP slurry - One-step slurry for Line-Hole process. - High polishing-rate selectivity between. Nano colloidal ceria slurry - High polishing-rate. - High polishing-rate selectivity between Poly-Si and SiO2 film. - Scratch decrease.
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