Magnetron sputtering is a widely used vacuum plasma deposition technique which has expanded into many large area thin film deposition technology applications. The upscalability with good uniformity and good process controllability are core strengths in magnetron sputtering. The typical ionisation levels on magnetron sputtering are low, usually below 5%, and that results in a lower ion availability. A high ion availability would enhance certain coating properties due to a higher ionic bombardment during film growth, and higher chemical/potential energy in reactive process. High ion density processes would usually give higher thermodynamic stability of the coating. The higher energy in itself affects film structure and density which would be higher than those obtained in conventional DC magnetron sputtering. DC magnetron sputtering would usually produce columnar structures.
In order to increase ionic availability and bombardment the technology results to add energy in different ways, for example by superimposing and RF discharge, like in highly ionised semiconductor processes, by introducing high excitation frequencies such as in DC Pulsed and HIPIMS.
In the present papers the authors offer an alternative, and would demonstrate the application of magnetic guided anode technology for the creation of ion bombardment conditions which produce high density smooth (non-columnar) structures.