Facilitated Processing of Nitrides, Oxides, Ceramics, TCO’s and Other Complex Thin Films by Using a Sophisticated Power Supply Technology
(Room Room 104-C)
02 May 19
1:40 PM
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2:00 PM
Tracks:
Emerging Technologies
Defect free processing has been the key word in the coating industry since day one of PVD. As equipment technology has evolved, demands on film properties have increased in the same manner. Film defects are mainly ARC related. This especially is true for oxide-ceramics and other complex thin films. A new approach in power supply technology is demonstrated to have (i) a purely current regulated technology with a sophisticated ARC-management, which makes it impossible to deliver energy into any arising ARC and (ii) have an independently fully regulated positive pulse. Astonishing results have been observed at the first introduction of this PS technology for oxide-ceramic films, TCO and other complex film materials. For e.g. ITO, not only a remarkably higher deposition rate, yet smoother, denser films which result in a significant increase in transmission and decrease in sheet resistivity have been achieved.
The PS topography can be utilized not only for DC or DC-Pulsing with a fully regulated asymmetrical bipolar positive pulse for single magnetron sputtering but also for dual magnetron or twin target applications, for symmetrical and asymmetrical sputtering/co-sputtering.