Enhancements in AZO Deposition Using Remote Plasma Sputtering
(Room Room 104-B)
30 Apr 19
11:40 AM
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12:00 PM
Tracks:
Heuréka! Post-Deadline Recent Developments
The requirement for alternative TCO materials to Indium Tin oxide (ITO) has become increasing apparent. In this study, high quality sputtered thin films of aluminium doped zinc oxide (AZO) have been studied using a remote plasma deposition process. The interaction of the plasma with the sputtered species enhances the thin film properties and material properties can be achieved at ambient temperatures (results obtained in this paper are without substrate heating). When combined with the use of pulsed-DC target biasing, ceramic targets and substrate manipulation the remote plasma process enables the deposition of AZO with a resistivity of 4x10-4 Ohm.cm. This is typically used to produce films with a sheet resistance of 8 ohms/sq combined with >91% average optical transmission in the visible range. These films have been evaluated for a wide range of potential applications. The paper will discuss the deposition process and material properties. The potential scale-up of this emerging technology can facilitate a realistic potential replacement of ITO for industrial applications.