Generating Index versus Thickness Data for Modern Coating Chambers and Designing Optical Thin Films with the Data Thus Generated
(Room Room 104-C)
29 Apr 19
5:20 PM
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5:40 PM
Layers thinner than 10 nm in optical thin film designs have been primarily avoided until recent times, probably due to the uncertainty of the index of such layers as a function of thickness. This could be the effects of nucleation and other deposition and film growth properties. Many modern chambers now have the capability to record broad-band spectra as a function of thickness, and software exists to fit the indices as a function of wavelength and thickness. These functions can then be applied during the design processes to incorporate the influence of inhomogeneous layers which better represent the results of actual deposition processes. With recent discussions of the design and control benefits of thinner films, such as Fencepost designs, the increased application of thin layers is anticipated. Metallic and conductive layers are also often used in thin layers where these tools should be beneficial. Some of the new metamaterials, quantum dots, and plasmonic materials may also work in these very thin film realms. Some of the problems and solutions for working with such thin films are demonstrated and discussed.