High Rate MW-Plasma-CVD Deposition for Hard Coatings on Large PC Glazing: First Results Make TMCTS a Promising Precursor Candidate
(Room Room 104-C)
29 Apr 19
10:00 AM
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10:20 AM
In general microwave plasma processes have even higher plasma density and faster reaction rates but showed lower uniformity in large area applications. This can be overcome by an assembly of a couple of linear “PlasmaLines” to create a large-scale planar plasma source. The influence of standard plasma parameters onto the most important required layer properties were evaluated in a lab (0.0225 m²) and a large area coating system (0.6 m²). To increase the efficiency a second approach was done by evaluating the influence of the chemical structure of siloxane precursors. Tetramethylcyclotetrasiloxane (TMCTS) in general shows a similar behaviour to plasma parameters as HMDSO, OMCTS and TMDSO. Coating properties are found equal: haze, transmission, adhesion and scratch resistance - ΔHaze 1.8 % - are fulfilling the specifications for glazings. TMCTS shows remarkable deposition rates: nearly 12 µm/min, but with a large spatial nonuniformity, generated by its high reactivity. Further benefits and challenges of this exceptional precursor are discussed.