Harlan™: High Rate-High Density Pulsed Magnetron Sputtering Source for Depositing Metal and Ceramic Coatings for Industrial Applications
(Room Exhibit Hall A)
30 Apr 19
2:30 PM
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4:00 PM
Magnetron source with game changing performance which can be configurable, scalable and tunable to any desired process such as DLC (ta-C, Me-DLC and a:C-H), High Rate Metal Nitrides (MeN) and High Rate Metal Oxide (MeO), Highly Ionized Metal (Me).