SEMICON Europa 2016

Eric Hendrickx
Program manager
imec, Advanced Patterning


Eric Hendrickx graduated from the University of Leuven in 1996, and subsequently from 1996 to 2001 was a postdoctoral research scientist at the University of Arizona (Optical Sciences Center) and the University of Leuven. In 2001 he joined the lithography department at imec, focusing on imaging and the characterization and on the introduction of the first 193nm high-NA immersion scanners into the imec cleanroom. In 2008, he started work on EUV lithography, and worked subsequently on ASML EUV Alpha-Demo tool, ASML NXE:3100 preproduction scanner, and ASML NXE:3300 scanner at imec. He currently is program manager at imec, and team lead of the imaging and reticles team.

Sessions :