Annealsys designs and manufactures Rapid Thermal Processing and Direct Liquid Injection deposition systems.
RTP systems with cold wall chamber, high temperature lamp furnaces (1500°C) and high vacuum capability from 3-inch to 200 mm for RTP and RTCVD processes. Applications: rapid thermal annealing, RTO, RTN, contact annealing, CVD of graphene and h-BN, selenization (CIGS)...
High temperature RTP / RTCVD furnace up to 2000°C for silicon carbide implant annealing and graphene applications.
Direct Liquid Injection deposition systems for deposition of metals, oxides, nitrides, III-V, 2D materials, etc. These systems can perform deposition processes with the widest range of chemicals including low vapor pressure and thermally unstable chemicals. They have multi process capabilities inside the same process chamber: CVD, ALD, MOCVD and pulse pressure CVD. The 2-inch system with infrared lamp heating extends the process capabilities with RTP and RTCVD. It is a unique machine on the market for process development of new materials.
Web sites: www.annealsys.com and wwww.annealsys.net
Product Categories
101 Photovoltaic Device Manufacturing
- PV: Cells
205 Nanotechnology Equipment and Tools
- Equipment, Nanotechnology Tools
206 PV Equipment
- Thin Film
207 Process Equipment
- Deposition; (CVD, PVD, ALD, Plating)
- Epitaxy Equipment
- Thermal Processing
900 Support Products
- Laboratory Apparatus and Supplies